Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal , nitride etch , and other cleaning applications in semiconductor and mems fabs 射頻等離子體9200是桶式爐脫模體,擁有可控制的高溫系統(tǒng)可去除光阻材料、氮化物蝕刻和半導(dǎo)體與微型機(jī)電系統(tǒng)等方面的清洗功能